Roughness characterization of waveguides fabricated using the Heidelberg MLA150 Maskless Aligner

Project Type:

E241

Date:

March 2019 (all day)

Areas of Interest:

Optical waveguides, Maskless lithography

Report:

Optical Waveguides using Heidelberg Mid-Course Report

Waveguide fabrication using the Heidelberg MLA150 Maskless Aligner- Final Report

Processing Technique (former Function and Method):

Patterning

Researchers and (Mentors):

Payton Broaddeus, Aditi Datta, (Swaroop Kommera), (J Provine)

List of Important Equipment:

Heidelberg MLA 150 (heidelberg)

Nano Nugget:

Waveguide fabrication with the Heidelberg MLA150 Maskless Aligner Run Sheet

In order to make the lowest loss waveguides, we need to find a combination of dose/defocus and reflow time/temperature that gives us the best resolution and the lowest line edge roughness and line width roughness.

Read more about Waveguide fabrication with the Heidelberg MLA150 Maskless Aligner Run Sheet