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Grayscale lithography for chiral nanophotonic structures

Project Type: 
E241
Date: 
June 2018
Areas of Interest: 
Grayscale lithography process development
Report(s): 
Grayscale lithography for chiral nanophotonic structures: Final Report
Processing Technique (former Function and Method): 
Direct Write
Researchers and (Mentors): 
Jefferson Dixon, Michelle Solomon, (Swaroop Kommera)
List of Important Equipment: 
Heidelberg MLA 150 (heidelberg)
Nano Nugget(s): 

Helpful hints for grayscale lithography on the Heidelberg MLA 150

When using grayscale lithography on the Heidelberg, there are a few quirks that may slow down your progress.  This document provides some warnings and helpful tricks to overcome the common roadblocks.

Presentation(s): 
Final Presentation: Grayscale lithography for chiral nanophotonic structures