Grayscale lithography for chiral nanophotonic structures

Project Type:

E241

Date:

June 2018 (all day)

Areas of Interest:

Grayscale lithography process development

Report:

Grayscale lithography for chiral nanophotonic structures: Final Report

Processing Technique (former Function and Method):

Direct Write

Researchers and (Mentors):

Jefferson Dixon, Michelle Solomon, (Swaroop Kommera)

List of Important Equipment:

Heidelberg MLA 150 (heidelberg)

Nano Nugget:

Helpful hints for grayscale lithography on the Heidelberg MLA 150

When using grayscale lithography on the Heidelberg, there are a few quirks that may slow down your progress. This document provides some warnings and helpful tricks to overcome the common roadblocks.

Read more about Helpful hints for grayscale lithography on the Heidelberg MLA 150

Presentation:

Final Presentation: Grayscale lithography for chiral nanophotonic structures