Etching Block Copolymer Directed Self-Assembly Holes

Project Type:

E241

Date:

March 2019 (all day)

Areas of Interest:

Directed Self Assembly, Nanoscale patterning

Report:

Etching Block Copolymer Directed Self-Assembly Holes Mid-Course Report

Block Copolymer Etching for Hole Shrink Applications- Final Report

Processing Technique (former Function and Method):

Patterning

Researchers and (Mentors):

Maryanne Tung, Hansen Qiao, (Michelle Rincon), (Archana Kumar), (Jim Kruger)

List of Important Equipment:

Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL)

Nano Nugget:

Block Copolymer Directed Self-Assembly Standard Operating Procedure

Drawing of DSA process

In this standard operating procedure (SOP), we propose a recipe for DSA with 70:30 PS-b-PMMA.

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Cross-sectional Characterization of Transferred DSA Holes using Focus Ion Beam

Here, we describe our strategy for inspecting the cross-section of features transferred from the BCP into an underlying hard material (e.g. SiO2, Si).

Read more about Cross-sectional Characterization of Transferred DSA Holes using Focus Ion Beam