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Etching Block Copolymer Directed Self-Assembly Holes

Project Type: 
E241
Date: 
March 2019
Areas of Interest: 
Directed Self Assembly, Nanoscale patterning
Report(s): 
Etching Block Copolymer Directed Self-Assembly Holes Mid-Course Report
Block Copolymer Etching for Hole Shrink Applications- Final Report
Processing Technique (former Function and Method): 
Patterning
Researchers and (Mentors): 
Maryanne Tung, Hansen Qiao, (Michelle Rincon), (Archana Kumar), (Jim Kruger)
List of Important Equipment: 
Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL)
Nano Nugget(s): 
Drawing of DSA process

Block Copolymer Directed Self-Assembly Standard Operating Procedure

In this standard operating procedure (SOP), we propose a recipe for DSA with 70:30 PS-b-PMMA.

Cross-sectional Characterization of Transferred DSA Holes using Focus Ion Beam

Here, we describe our strategy for inspecting the cross-section of features transferred from the BCP into an underlying hard material (e.g. SiO2, Si).