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Characterization of TMDs and Contact schemes for Photovoltaic Applications

Project Type: 
E241
Date: 
March 2019
Areas of Interest: 
TMD, photovoltaics
Report(s): 
Characterization of TMDs and Contact schemes for Photovoltaic Applications Mid-Course Report
Characterization of TMDs and Contact schemes for Photovoltaic Applications- Final Report
Processing Technique (former Function and Method): 
Material Transfer
Researchers and (Mentors): 
Arvindh Kumar, Koosha Nassiri Nazif, (Michelle Rincon)
List of Important Equipment: 
Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL)
Glovebox-r (glovebox-r)
Nano Nugget(s): 

Characterization of TMDs and Contact schemes for Photovoltaic Applications- Standard Operating Procedure

The standard operating procedures for 1. Optimal TMD exfoliation on SiO2 substrate, 2. Etching of TMD flakes, 3. Transfer from TMD flakes from SiO2 substrate to a metallic substrate are explained in details.