Characterization of TMDs and Contact schemes for Photovoltaic Applications

Project Type:

E241

Date:

March 2019 (all day)

Areas of Interest:

TMD, photovoltaics

Report:

Characterization of TMDs and Contact schemes for Photovoltaic Applications Mid-Course Report

Characterization of TMDs and Contact schemes for Photovoltaic Applications- Final Report

Processing Technique (former Function and Method):

Material Transfer

Researchers and (Mentors):

Arvindh Kumar, Koosha Nassiri Nazif, (Michelle Rincon)

List of Important Equipment:

Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL)

Glovebox-r (glovebox-r)

Nano Nugget:

Characterization of TMDs and Contact schemes for Photovoltaic Applications- Standard Operating Procedure

The standard operating procedures for 1. Optimal TMD exfoliation on SiO2 substrate, 2. Etching of TMD flakes, 3. Transfer from TMD flakes from SiO2 substrate to a metallic substrate are explained in details.

Read more about Characterization of TMDs and Contact schemes for Photovoltaic Applications- Standard Operating Procedure