2016 EE410 CV Measurement report

This report discusses the CV measurement result done in SNF measurement Lab Micromanipulator station using the CV sweep algorithm (which controls the Agilent 4275A LCR Meter). A known good sample of oxide (130 Ang) capacitor fabricated elsewhere was used to calibrate the measurement setup prior to measuring the EE410 Sample. Results from both measurements are presented in this report.