Developers
Developers remove resist in UV-exposed areas (positive resists) or in UV-protected areas (negative resists) using an acid or base to dissolve the resist. The developer chemical required will depend on the specific resist used.
List of Developers
| Equipment name & Badger ID | Training Required & Charges | Cleanliness |
Location |
Chemicals | Notes |
|---|---|---|---|---|---|
|
Wet Bench Miscellaneous wbmiscres |
Wet Bench Miscellaneous Photoresist Training | SNF Cleanroom Paul G Allen L107 |
Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents! |
