Cones

Short Name:

Cones

Equipment Tables

Equipment name & NEMO ID	Technique	Cleanliness	Materials Lab Supplied	Developer	Substrate Size	Substrate Type
Ex Fab Develop Wet Bench wbexfab_dev	Photolithography > Resist Develop > Resist Develop (manual) Wet Chemical Processing	Flexible		AZ 1:1 MF-26A developer	Pieces 2" 3" 4" 6" 8" 12" Cones Disks Other
PDS 2010 LABCOTER™ 2 Parylene Deposition System parcoater	Deposition	Flexible	poly(p-xylylene)		Pieces 2" 3" 4" 6" 8" Cones Disks Other	Silicon (Si) Silicon Germanium (SiGe) Quartz (SiO2) Sapphire (Al₂O₃) Glass (SiO₂) Silicon Carbide (SiC) Gallium Nitride (GaN) III-V (III-V) Gallium Arsenide (GaAs) Polymer (Various) Carbon Polymer Based (Various) Lithium Niobate (LiNb) Other (ProMCom approval required) (Various)