Ge/SiGe Surface Passivation by ALD
Project Type:
E241
Date:
June 2015
Areas of Interest:
Ge/SiGe photo luminescence modification by ozone induced oxidation, annealing, and capping in ALD system
Processing Technique (former Function and Method):
Researchers and (Mentors):
Ching-Ying Lu, Muyu Xue, (Michelle Rincon), (J Provine)
List of Important Equipment:
Presentation(s):
