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Ge/SiGe Surface Passivation by ALD

Project Type: 
June 2015
Areas of Interest: 
Ge/SiGe photo luminescence modification by ozone induced oxidation, annealing, and capping in ALD system
Processing Technique (former Function and Method): 
Researchers and (Mentors): 
Ching-Ying Lu, Muyu Xue, (Michelle Rincon), (J Provine)
List of Important Equipment: