Standard Clean 2 | Stanford Nanofabrication Facility

Preferred Short Name:

SC2

Chemical Formula:

H₂O:H₂O₂:HCl (5:1:1)

Full Chemical Name:

DI water, Hydrogen peroxide, Hydrochloric Acid

SC2 is usually used as a follow up step to an SC1 clean. This step in the clean sequence targets metal ion surface contamination and is required before going into high temperature gate oxide growth.

Equipment name & NEMO ID	Training Required & Charges	Cleanliness	Location	Chemicals	Notes
Wet Bench Clean 1 wbclean-1	Wet Bench Clean1and2 Training 2.00 hours	Clean	SNF Paul G Allen L107 Cleanroom	50:1 HF SC1 SC2	No resist allowed. Resist should have been removed at the wbclean_res-piranha.
Wet Bench Clean 2 wbclean-2	Wet Bench Clean1and2 Training 2.00 hours	Clean	SNF Paul G Allen L107 Cleanroom	50:1 HF 6:1 BOE SC1 SC2	No resist allowed. Resist should have been removed at the wbclean_res-piranha
Wet Bench Decontamination wbdecon	Wet Bench Decontamination Training	Clean	SNF Paul G Allen L107 Cleanroom	SC2	KOH or wafersaw or post-cmp decontamination
Wet Bench Flexcorr 1 wbflexcorr-1	Wet Bench Flexcorr 1and2 and 3and4 Training 2.00 hours	Flexible	SNF Paul G Allen L107 Cleanroom	Acids Bases Gold Etchant 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.