SC2 is usually used as a follow up step to an SC1 clean. This step in the clean sequence targets metal ion surface contamination and is required before going into high temperature gate oxide growth.
Equipment name & Badger ID | Training Required & Charges | Cleanliness | Location | Chemicals | Notes |
---|---|---|---|---|---|
Wet Bench Clean 1 wbclean-1 |
Wet Bench Clean1and2 Training 2.00 hours |
SNF Cleanroom Paul G Allen L107 |
No resist allowed. Resist should have been removed at the wbclean_res-piranha. |
||
Wet Bench Clean 2 wbclean-2 |
Wet Bench Clean1and2 Training 2.00 hours |
SNF Cleanroom Paul G Allen L107 |
No resist allowed. Resist should have been removed at the wbclean_res-piranha |
||
Wet Bench Decontamination wbdecon |
Wet Bench Decontamination Training | SNF Cleanroom Paul G Allen L107 |
KOH or wafersaw or post-cmp decontamination |
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Wet Bench Flexcorr 1 wbflexcorr-1 |
Wet Bench Flexcorr 1and2 and 3and4 Training 2.00 hours |
SNF Cleanroom Paul G Allen L107 |
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only. |