Skip to content
Skip to navigation
Stanford Nanofabrication Facility
Navigation menu
Home
Hafnium Nitride
Chemical Formula:
HfN
Equipment Tabs
Deposition Equipment
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
Equipment name & Badger ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
Fiji 1 ALD
fiji1
Semiclean
SNF Cleanroom Paul G Allen L107
1.00 Å
-
50.00 nm
Metal oxides
Al
2
O
3
HfN
HfO
2
Pt
Ru
SiO
2
Ta
2
O
5
TaN
TiN
TiO
2
Various Dielectrics
ZrO
2
Fiji 2 ALD
fiji2
Flexible
SNF Cleanroom Paul G Allen L107
1.00 Å
-
50.00 nm
Metal oxides
Al
2
O
3
Ga
2
O
3
HfN
HfO
2
In
2
O
3
In
x
Sn
y
O
z
MoO
3
Ni
x
O
y
Pt
Ru
Si3N4
SiO
2
SnO
2
SrO
Ta
2
O
5
TiN
TiO
2
Various Dielectrics
ZrO
2
Projects
Metal Nitride Films Using ALD- Final Presentation
-- (Presentation)
