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Resist Develop

Technique Tabs

Main Tab

Processing Techniques	Equipment name & NEMO ID	Teaser Blurb	Cleanliness	Location
Resist Develop (manual), Wet Chemical Processing	Ex Fab Develop Wet Bench wbexfab_dev	Manual developing of photoresist using mainly MF-26A.	Flexible	SNF Exfab Paul G Allen 104 Stinson
Resist Develop (automatic)	SVG Develop Track 1 svgdev	Automatic resist development of 4" wafers in cassette holding up to 25 wafers.	All	SNF Cleanroom Paul G Allen L107
Resist Develop (automatic)	SVG Develop Track 2 svgdev2	Automatic resist development of 4" wafers in cassette holding up to 25 wafers.	All	SNF Cleanroom Paul G Allen L107
Resist Develop (manual), Wet Chemical Processing	Wet Bench Miscellaneous wbmiscres	Manual developing of photoresist using mainly AZ1:1 developer.	Flexible	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & NEMO ID	Cleanliness	Chemicals	Substrate Size	Maximum Load (number of wafers)	Developer	Notes
Resist Develop (manual), Wet Chemical Processing	Ex Fab Develop Wet Bench wbexfab_dev	Flexible		Pieces 2" 3" 4" 6" 8" 12" Other		AZ 1:1 MF-26A developer	Manual development of resist in beakers. SNF approved developers only. No solvents!
Resist Develop (automatic)	SVG Develop Track 1 svgdev	All		4"	25 4 inch wafers	MF-26A developer	Automatic development.
Resist Develop (automatic)	SVG Develop Track 2 svgdev2	All		4"	25 4 inch wafers	MF-26A developer	Automatic development.
Resist Develop (manual), Wet Chemical Processing	Wet Bench Miscellaneous wbmiscres	Flexible	Developers	Pieces 2" 3" 4" 6"		AZ 1:1	Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents!