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Stanford Nanofabrication Facility
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Technique Tabs
Main Tab
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Processing Techniques
Equipment name & NEMO ID
Teaser Blurb
Cleanliness
Location
Direct Write
Heidelberg MLA 150
heidelberg
Maskless writer that patterns without prior fabrication of masks.
All
SNF Exfab Paul G Allen 104 Stinson
Direct Write
Heidelberg MLA 150 - 2
heidelberg2
Maskless writer that patterns without prior fabrication of masks.
All
SNF Cleanroom Paul G Allen L107
Detail Tab
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Processing Technique
Equipment name & NEMO ID
Cleanliness
Minimum Resolution
Exposure Wavelength
Substrate Size
Maximum Load (number of wafers)
Notes
Direct Write
Heidelberg MLA 150 - 2
heidelberg2
All
0.60 μm
375 nm
Pieces
2"
3"
4"
6"
1
Direct Write
Direct Write
Heidelberg MLA 150
heidelberg
All
1.00 μm
405 nm
Pieces
2"
3"
4"
6"
1
Direct Write