Mask Cleaning (manual) | Stanford Nanofabrication Facility
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Mask Cleaning (manual)

Cleanliness of the photomask is important to the quality of the pattern transfer.

Technique Tabs

Main Tab
Processing Techniques Equipment name & NEMO ID Teaser Blurb Cleanliness Location
Mask Cleaning (manual), Wet Chemical Processing Mask Scrubber
masksrub

Manual mask cleaner for one 5 inch mask, water under pressure.

All SNF Cleanroom Paul G Allen L107
Detail Tab
Processing Technique Equipment name & NEMO ID Cleanliness Chemicals Mask Size Notes
Mask Cleaning (manual), Wet Chemical Processing Mask Scrubber
masksrub
All 5 inch

5 inch mask cleaning, water under pressure, no chemicals

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