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Stanford Nanofabrication Facility
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Hall measurement
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Sheet Resistance Measurement
,
Hall measurement
Lakeshore Hall Measurement System
LakeshoreHall
Contactless sheet resistance mapping system for up to 8" wafer, based on eddy current
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SNF Exfab Paul G Allen 151 Ocean
Detail Tab
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Processing Technique
Equipment name & NEMO ID
Cleanliness
Material Thickness Range
Substrate Size
Maximum Load (number of wafers)
Process Temperature Range
Sheet Resistance Measurement
,
Hall measurement
Lakeshore Hall Measurement System
LakeshoreHall
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100.00 μm
-
1000.00 μm
Pieces
1 piece
-258 °C - 1000 °C