Tetraethyl Orthosilicate

Chemical Formula:

Si(OC₂H₅)₄

Gases Equipment Tabs

Etch Equipment Table

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Anneal/Oxidation Equipment Table

Deposition Equipment
Equipment name & Badger ID	Cleanliness	Location	Material Thickness Range	Approved Materials supplied by Lab
Tystar Bank 3 Tube 11 TEOS B3T11 Clean TEOS	Clean	SNF Cleanroom Paul G Allen L107	25.00 Å - 2.00 μm	SiO₂