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BiSbTe etch in Ox-35

PROM Request Title: 
BiSbTe etch in Ox-35
PROM Request Summary: 
Contamination evaluation plan documented to introduce Bi into Ox-35 etcher.
PROM Date: 
PROM Decision: 
PROM Request is approved with no special requirements around processing. BiSbTe does contaminate the etch chamber, but contaminants can be removed with the cleaning procedures documented. All users of the Ox-35 who will go to the MOCVD equipment a...