Wet methods use either solvents or acids/bases to dissolve the resist in order to remove it from the substrate.
The wet bench you need will depend on the materials on your substrate as well as your substrate itself in addition cleanliness category of your sample. (For more about the cleanliness categories, please visit the Cleanliness (previously Contamination) Groups page).
| Processing Techniques | Equipment name & NEMO ID | Teaser Blurb | Cleanliness | Location |
|---|---|---|---|---|
| Piranha Cleaning, Wet Resist Removal, Wet Chemical Processing |
Wet Bench Clean_res-piranha wbclean_res-piranha |
Wet Bench Clean_res-piranha is part of the 'clean' cleanliness group and is used to clean or remove resist from 3", 4", and 6" silicon, quartz, and silicon germanium wafers using piranha. 2 baths are available and can hold up to 25 wafers. |
Clean | SNF Paul G Allen L107 Cleanroom |
| Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching, Wet Chemical Processing |
Wet Bench Flexcorr 1 wbflexcorr-1 |
Manual wet etching of non-standard materials using only SNF approved acids or bases. Hot plate available. GaAs allowed in personal labware only. |
Flexible | SNF Paul G Allen L107 Cleanroom |
| Solvent Cleaning, Wet Resist Removal, Metal Lift-off |
Wet Bench Flexible Solvents wbflexsolv |
Manual solvent cleaning of materials in the flexible cleanliness group. |
Flexible | SNF Paul G Allen L107 Cleanroom |
| Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing |
Wet Bench Flexible Solvents 1 wbflexsolv-1 |
Manual solvent cleaning, two ultrasonic baths. |
Flexible | SNF Paul G Allen L107 Cleanroom |
| Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing |
Wet Bench Flexible Solvents 2 wbflexsolv-2 |
Manual solvent cleaning and resist removal, hot plate. |
Flexible | SNF Paul G Allen L107 Cleanroom |
| Wet Resist Removal, Wet Chemical Processing |
Wet Bench Resist Strip wbresstrip-1 |
Wet bench to remove resist using SRS-100 or PRS1000. |
Clean (Ge), Semiclean, Flexible | SNF Paul G Allen L107 Cleanroom |