Germanium

For LOL2000 bake or bakes which are not allowed in the other ovens and need higher temperatures, up to 200C, programmable.

Bakes wafers after resist coating.

To maintain cleanliness level, cleans of both the chamber and wafers are required prior to processing -

Substrates in clean category: Pre-Diffusion Clean

For semi-clean substrates: Standard Metal Clean (SRS100 + PRS1000) . Run Chamber clean (no dummies) and conditioning with clean dummies prior to run

Pieces need a carrier wafer; Isotropic Etching

Automatic development.

Automatic HMDS, Resist spinning, and Bake. AZ5214IR Image Reversal.