SEM -Zeiss Merlin sem-merlin |
SEM-Merlin Training |
"All" |
SNF Exfab Paul G Allen L104 Stinson |
|
Finetech Lambda flipchipbonder |
Flip Chip Bonder Training |
Flexible |
SNF Exfab Paul G Allen L104 Stinson |
|
Profilometer AlphaStep D-300 alphastep2 |
AlphaStep2 Training |
Flexible |
SNF Exfab Paul G Allen L104 Stinson |
|
Heidelberg MLA 150 heidelberg |
Heidelberg Training |
"All" |
SNF Exfab Paul G Allen L104 Stinson |
Direct Write |
Nanospec 210XP nanospec2 |
Nanospec Training |
"All" |
SNF Exfab Paul G Allen L104 Stinson |
Manual Film Thickness Measurement. Single or dual layer transparent films > 300 Ã
|
Profilometer Alphastep 500 alphastep |
Alphastep 500 Profilometer Training |
Flexible |
SNF Exfab Paul G Allen L104 Stinson |
500Å to 300µm
|
Heidelberg3 heidelberg3 |
Heidelberg Training |
"All" |
SNF Exfab Paul G Allen L104 Stinson |
|
Keyence Digital Microscope VHX-6000 keyence |
Microscope Keyence Training |
"All" |
SNF Exfab Paul G Allen L104 Stinson |
|
Wet Bench Miscellaneous wbmiscres |
Wet Bench Miscellaneous Photoresist Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents! |
Oven 90°C prebake oven90 |
Resist Prebake Oven 90°C Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Bakes wafers after resist coating. |
Lesker2 Sputter lesker2-sputter |
Sputter Lesker 1&2 Training |
Semiclean |
SNF Paul G Allen L107 Cleanroom |
reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter |
Wet Bench Resist Strip wbresstrip-1 |
Wet Bench Resist Strip |
Clean (Ge), Semiclean, Flexible |
SNF Paul G Allen L107 Cleanroom |
Wet Resist Removal: SRS-100 or PRS1000 |
Karl Suss MA-6 Contact Aligner karlsuss2 |
Contact Aligner Karl Suss MA-6 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
1:1 Contact Aligner.
Backside align. |
AJA2 Evaporator aja2-evap |
Evaporator AJA2 Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
For more than 300nm deposition, please contact Gabe Catalano <gcatalano@stanford.edu> in advance |
Wet Bench Flexible Solvents 1 wbflexsolv-1 |
Wet Bench Flexible Solvents 1 and 2 Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual solvent cleaning, two ultrasonic baths. |
Karl Suss MA-6 Contact Aligner karlsuss |
Contact Aligner Karl Suss MA-6 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
1:1 Contact Aligner.
Backside align, including IR. |
Wet Bench Flexible Solvents 2 wbflexsolv-2 |
Wet Bench Flexible Solvents 1 and 2 Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual solvent cleaning, hot plate |
Wet Bench Solvent Lithography lithosolv |
Lithography Solvent Bench Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning. |
Tystar Bank 1 Tube 3 Poly B1T3 Flexible Poly |
Tystar LPCVD Tube Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
|
Wet Bench Flexcorr 3 wbflexcorr-3 |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual wet etching of non-standard materials using acids or bases. Hot Plate available. GaAs not allowed. |