Wet Bench Flexcorr 1 wbflexcorr-1 |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only. |
Wet Bench Flexcorr 2 wbflexcorr-2 |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual wet etching of non-standard materials. Hot pots available. GaAs allowed in personal labware only |
Wet Bench Flexcorr 3 wbflexcorr-3 |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual wet etching of non-standard materials using acids or bases. Hot Plate available. GaAs not allowed. |
Wet Bench Flexible Solvents wbflexsolv |
Wet Bench Flexible Solvents 1 and 2 Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual solvent cleaning of substrates or resist removal. |
Wet Bench Flexible Solvents 1 wbflexsolv-1 |
Wet Bench Flexible Solvents 1 and 2 Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual solvent cleaning, two ultrasonic baths. |
Wet Bench Flexible Solvents 2 wbflexsolv-2 |
Wet Bench Flexible Solvents 1 and 2 Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual solvent cleaning, hot plate |
Wet Bench Miscellaneous wbmiscres |
Wet Bench Miscellaneous Photoresist Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents! |
Wet Bench Resist Strip wbresstrip-1 |
Wet Bench Resist Strip |
Clean (Ge), Semiclean, Flexible |
SNF Paul G Allen L107 Cleanroom |
Wet Resist Removal: SRS-100 or PRS1000 |
Wet Bench Solvent Lithography lithosolv |
Lithography Solvent Bench Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning. |
Woollam woollam |
Woollam Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
|
Xactix Xenon Difluoride Etcher xactix |
Xactix Xenon Difluoride Etcher Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Isotropic Si etching; can be used for backside Si removal on small pieces |