Germanium

3 Probe Heads for different cleanliness groups.

500Å to 300µm

To maintain cleanliness level, cleans of both the chamber and wafers are required prior to processing -

Substrates in clean category: Pre-Diffusion Clean

For semi-clean substrates: Standard Metal Clean (SRS100 + PRS1000) . Run Chamber clean (no dummies) and conditioning with clean dummies prior to run

Bakes wafers after resist coating.

For LOL2000 bake or bakes which are not allowed in the other ovens and need higher temperatures, up to 200C, programmable.

reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter

1:1 Contact Aligner. Backside align.