MOCVD is a chemical vapour deposition method using metal organics to produce single- or polycrystalline thin films. It is a process for growing crystalline layers to create complex semiconductor multilayer structures.
| Processing Techniques | Equipment name & NEMO ID | Teaser Blurb | Cleanliness | Location |
|---|---|---|---|---|
| Metal-Organic (MO) CVD |
Aixtron MOCVD - III-V system aix200 |
Flexible | SNF MOCVD Paul G Allen 213XA | |
| Metal-Organic (MO) CVD |
Aixtron MOCVD - III-N system aix-ccs |
Aixtron MOCVD for III-N semiconductors: InN, GaN, AlN, InGaN, InAlN, AlGaN, InGaAlN. Aix-ccs is a vertical metal organic chemical vapor deposition (MOCVD) system. |
Clean (MOCVD) | SNF MOCVD Paul G Allen 213XA |