The following is a list of equipment where 2 inch round substrates are allowed.
For more than 300nm deposition, please contact Neel Mehta <nmehta26@stanford.edu> in advance
Spray coating of resists
Pieces need a carrier wafer; Isotropic Etching
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Two programs: Singe and HMDS prime or Singe only. No Resist allowed!
Manual wet etching of non-standard materials. Hot pots available. GaAs allowed in personal labware only
For LOL2000 bake or bakes which are not allowed in the other ovens and need higher temperatures, up to 200C, programmable.
For more than 300nm deposition, please contact Graham Ewing<grahamj.ewing@stanford.edu> in advance
reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter