The "Clean (Ge)" cleanliness group is part of the SNF/ExFab contamination policy.
The following is a list of equipment that fall into the "Clean (Ge)" category.
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID | Technique | Cleanliness | Primary Materials Etched | Process Temperature Range | Chemicals | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|---|
|
Wet Bench Resist Strip wbresstrip-1 |
Clean (Ge), Semiclean, Flexible |
20 °C - 60 °C
|
25 4 inch wafers |