Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
Equipment name & NEMO ID |
Technique | Cleanliness | Minimum Resolution | Exposure Wavelength | Mask Size | Max Exposure Area | Substrate Size | Substrate Type |
|---|---|---|---|---|---|---|---|---|
|
ASML PAS 5500/60 i-line Stepper asml |
"All" |
|
365 nm | 5 inch | ||||
|
Karl Suss MA-6 Contact Aligner karlsuss2 |
"All" |
|
365 nm or 405 nm | 4 inch, 5 inch, 7 inch | 5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch | |||
|
Karl Suss MA-6 Contact Aligner karlsuss |
"All" |
|
365 nm | 4 inch, 5 inch, 7 inch | 5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch |