Short Name:
4"
The following is a list of equipment where 4 inch round substrates are allowed.
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
Equipment name & NEMO ID |
Training Required & Charges | Cleanliness | Location | Notes |
|---|---|---|---|---|
|
Wet Bench Miscellaneous wbmiscres |
Wet Bench Miscellaneous Photoresist Training | Flexible | SNF Paul G Allen L107 Cleanroom |
Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents! |
|
Wet Bench Resist Strip wbresstrip-1 |
Wet Bench Resist Strip | Clean (Ge), Semiclean, Flexible | SNF Paul G Allen L107 Cleanroom |
Wet Resist Removal: SRS-100 or PRS1000 |
|
Wet Bench Solvent Lithography lithosolv |
Lithography Solvent Bench Training | Flexible | SNF Paul G Allen L107 Cleanroom |
Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning. |
|
Woollam woollam |
Woollam Training | "All" | SNF Paul G Allen L107 Cleanroom | |
|
Xactix Xenon Difluoride Etcher xactix |
Xactix Xenon Difluoride Etcher Training | "All" | SNF Paul G Allen L107 Cleanroom |
Isotropic Si etching; can be used for backside Si removal on small pieces |