Short Name:
4"
The following is a list of equipment where 4 inch round substrates are allowed.
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Notes |
|---|---|---|---|---|
|
Aixtron MOCVD - III-N system aix-ccs |
MOCVD - III-N Aixtron training | Clean (MOCVD) | SNF MOCVD Paul G Allen 213XA |
N and P doping available. For Si clean: SC1, SC2, HF dip. For Sapphire clean: SC1, SC2. For GaN template on Si or Sapphire: Piranha, SC1, SC2. |
|
Aixtron Black Magic graphene CVD furnace aixtron-graphene |
CVD graphene furnace Aixtron Black Magic training | Flexible | SNF Exfab Paul G Allen L119 Año Nuevo | |
|
MVD mvd |
MVD Training | Flexible | SNF Paul G Allen L107 Cleanroom |
Reactor located inside glovebox |
|
Savannah ALD savannah |
ALD Savannah Training | Flexible | SNF Paul G Allen L107 Cleanroom | |
|
Fiji 3 ALD fiji3 |
ALD Fiji 3 Training | Flexible | SNF Paul G Allen L107 Cleanroom |
Restricted to non-conductive films only |
|
Fiji 1 ALD fiji1 |
ALD Fiji 1 and 2 Training | Semiclean | SNF Paul G Allen L107 Cleanroom | |
|
Fiji 2 ALD fiji2 |
ALD Fiji 1 and 2 Training | Flexible | SNF Paul G Allen L107 Cleanroom |