Short Name:
4"
The following is a list of equipment where 4 inch round substrates are allowed.
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID |
Training Required & Charges |
Cleanliness | Location | Notes |
|---|---|---|---|---|
|
Tystar Bank 2 Tube 8 LTO B2T8 Clean LTO |
Tystar LPCVD Tube Training | Clean | SNF Paul G Allen L107 Cleanroom | |
|
CHA Solutions II Evaporator cha-evap |
Evaporator CHA Training | Flexible | SNF Paul G Allen L107 Cleanroom |
For more than 300nm deposition, please contact Neel Mehta <nmehta26@stanford.edu> in advance |
|
Oxford Plasma Pro ICP-RIE ALE Ox-ALE |
Oxford Plasma Pro ICP-RIE ALE Training | Flexible | SNF Paul G Allen L107 Cleanroom | |
|
Oxford Plasma Pro ICP-RIE Ox Ox-Ox |
Oxford Plasma Pro ICP-RIE Ox Training | Clean | SNF Paul G Allen L107 Cleanroom | |
|
Oxford Plasma Pro PECVD Ox-PECVD |
Oxford Plasma Pro PECVD Training | Semiclean, Flexible | SNF Paul G Allen L107 Cleanroom |