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Gallium Arsenide

Chemical Formula:

GaAs

Equipment name & NEMO ID	Training Required & Charges	Cleanliness	Location	Notes
Woollam woollam	Woollam Training	"All"	SNF Paul G Allen L107 Cleanroom
Xactix Xenon Difluoride Etcher xactix	Xactix Xenon Difluoride Etcher Training	"All"	SNF Paul G Allen L107 Cleanroom	Isotropic Si etching; can be used for backside Si removal on small pieces

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Equipment name & NEMO ID	Technique	Cleanliness	Primary Materials Etched	Gases	Substrate Size	Substrate Type	Maximum Load
Woollam woollam	Characterization > Ellipsometry	"All"			Pieces 2" 3" 4" 6" 8"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (SiC) , (GaN) , (III-V) , (GaAs) , (Various) , (Various) , (LiNb) , (Various)	1
Xactix Xenon Difluoride Etcher xactix	Etching > Vapor Etching	"All"	Ge Si SiGe	N₂ XeF₂	Pieces 2" 3" 4" 6"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (SiC) , (GaN) , (III-V) , (GaAs)	1

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