Chemical Formula:
GaAs
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID |
Training Required & Charges |
Cleanliness | Location | Notes |
|---|---|---|---|---|
|
Oven 90°C prebake oven90 |
Resist Prebake Oven 90°C Training | "All" | SNF Paul G Allen L107 Cleanroom |
Bakes wafers after resist coating. |
|
Aixtron MOCVD - III-V system aix200 |
MOCVD - III-V Aixtron training | Flexible | SNF MOCVD Paul G Allen 213XA |
N and P doping available. For Si clean: SC1, SC2, HF dip. For III-V clean: HCl or HF dip. |