Sapphire

reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter

For LOL2000 bake or bakes which are not allowed in the other ovens and need higher temperatures, up to 200C, programmable.

Bakes wafers after resist coating.

4" wafers; can be adopted to do 6" or 8" wafers; pieces need to be bonded to carrier wafers

To maintain cleanliness level, cleans of both the chamber and wafers are required prior to processing -

Substrates in clean category: Pre-Diffusion Clean

For semi-clean substrates: Standard Metal Clean (SRS100 + PRS1000) . Run Chamber clean (no dummies) and conditioning with clean dummies prior to run