Sapphire

non contact 3D optical profiling

4" wafers; can be adopted to do 6" or 8" wafers; pieces need to be bonded to carrier wafers

Adjustable spin speeds, spin time. SNF-acceptable resists or polymers. Ebeam resists

3 Probe Heads for different cleanliness groups.

reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter

N and P doping available. For Si clean: SC1, SC2, HF dip. For Sapphire clean: SC1, SC2. For GaN template on Si or Sapphire: Piranha, SC1, SC2.