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Prometrix Resistivity Mapping System |
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3 Probe Heads for different cleanliness groups.
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Profilometer Alphastep 500 alphastep |
Alphastep 500 Profilometer Training |
Flexible |
SNF Exfab Paul G Allen L104 Stinson |
500Å to 300µm
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Heidelberg3 heidelberg3 |
Heidelberg Training |
"All" |
SNF Exfab Paul G Allen L104 Stinson |
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Keyence Digital Microscope VHX-6000 keyence |
Microscope Keyence Training |
"All" |
SNF Exfab Paul G Allen L104 Stinson |
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Heidelberg MLA 150 heidelberg |
Heidelberg Training |
"All" |
SNF Exfab Paul G Allen L104 Stinson |
Direct Write |
Profilometer AlphaStep D-300 alphastep2 |
AlphaStep2 Training |
Flexible |
SNF Exfab Paul G Allen L104 Stinson |
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Finetech Lambda flipchipbonder |
Flip Chip Bonder Training |
Flexible |
SNF Exfab Paul G Allen L104 Stinson |
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Nanospec 210XP nanospec2 |
Nanospec Training |
"All" |
SNF Exfab Paul G Allen L104 Stinson |
Manual Film Thickness Measurement. Single or dual layer transparent films > 300 Ã
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Woollam woollam |
Woollam Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
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Xactix Xenon Difluoride Etcher xactix |
Xactix Xenon Difluoride Etcher Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Isotropic Si etching; can be used for backside Si removal on small pieces |
Sensofar S-neox s-neox |
Sensofar S-neox Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
non contact 3D optical profiling |
Oxford Plasma Pro PECVD Ox-PECVD |
Oxford Plasma Pro PECVD Training |
Semiclean, Flexible |
SNF Paul G Allen L107 Cleanroom |
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Oxford Dielectric Etcher oxford-rie |
Oxford Dielectric Etcher Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
4" wafers; can be adopted to do 6" or 8" wafers; pieces need to be bonded to carrier wafers |
Headway Manual Resist Spinner headway2 |
Resist Coat (manual) Headway Manual Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Adjustable spin speeds, spin time. SNF-acceptable resists or polymers. Ebeam resists |
SVG Develop Track 1 svgdev |
Resist Develop SVG tracks 1 and 2 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Automatic development. |
EVG 101 Spray Coater evgspraycoat |
Spray Coater EVG 101 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Spray coating of resists |
Flexus 2320 Stress Tester stresstest |
Stress Tester Flexus 2320 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
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Lesker3 Sputter lesker3-sputter |
Sputter Lesker 3 Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
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PlasmaTherm Shuttlelock PECVD System ccp-dep |
PlasmaTherm Shuttlelock PECVD System Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
To maintain cleanliness level, cleans of both the chamber and wafers are required prior to processing -
Substrates in clean category: Pre-Diffusion Clean
For semi-clean substrates: Standard Metal Clean (SRS100 + PRS1000) . Run Chamber clean (no dummies) and conditioning with clean dummies prior to run |
SVG Resist Coat Track 1 svgcoat |
Resist Coat Auto SVG Tracks 1 and 2 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Automatic Resist spinning and bake |