Chemical Formula:
SiO2
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Notes |
|---|---|---|---|---|
|
Aixtron MOCVD - III-V system aix200 |
MOCVD - III-V Aixtron training | Flexible | SNF MOCVD Paul G Allen 213XA |
N and P doping available. For Si clean: SC1, SC2, HF dip. For III-V clean: HCl or HF dip. |
|
Savannah ALD savannah |
ALD Savannah Training | Flexible | SNF Paul G Allen L107 Cleanroom | |
|
Fiji 2 ALD fiji2 |
ALD Fiji 1 and 2 Training | Flexible | SNF Paul G Allen L107 Cleanroom | |
|
Fiji 1 ALD fiji1 |
ALD Fiji 1 and 2 Training | Semiclean | SNF Paul G Allen L107 Cleanroom |