Skip to content Skip to navigation

Silicon Carbide

Chemical Formula: 
SiC

Silicon carbide can deposited in the ccp system by the reaction between silane and methane.

Equipment Tabs

Deposition Equipment
Partial words okay.
Deposition Equipment
Equipment name & Badger ID Cleanliness Locationsort descending Material Thickness Range Approved Materials supplied by Lab
PlasmaTherm Shuttlelock PECVD System
ccp-dep
SNF Cleanroom Paul G Allen L107
100.00 Å - 4.00 μm
PlasmaTherm Versaline HDP CVD System
hdpcvd
SNF Cleanroom Paul G Allen L107
500.00 Å - 4.00 μm
Projects
Subscribe to