Silicon Germanium
Chemical Formula:
SiGe
| Equipment name & NEMO ID |
Training Required & Charges |
Cleanliness | Location | Notes |
|---|---|---|---|---|
|
CHA Solutions II Evaporator cha-evap |
Evaporator CHA Training | Flexible | SNF Cleanroom Paul G Allen L107 |
For more than 300nm deposition, please contact Neel Mehta <nmehta26@stanford.edu> in advance |
Pages
| Equipment name & NEMO ID | Technique | Cleanliness | Primary Materials Etched | Gases | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|
|
Xactix Xenon Difluoride Etcher xactix |
All |
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1 |
