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Silicon Germanium

Chemical Formula: 
SiGe
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Equipment name & NEMO IDsort ascending Training Required & Charges Cleanliness Location Notes
AJA Evaporator
aja-evap
Evaporator AJA training Flexible SNF Exfab Paul G Allen 155A Venice

For more than 300nm deposition, please contact Graham Ewing<grahamj.ewing@stanford.edu> in advance

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Equipment name & NEMO IDsort ascending Technique Cleanliness Material Thickness Range Materials Lab Supplied Substrate Size Substrate Type Maximum Load
AJA Evaporator
aja-evap
Flexible
0.00 - 300.00 nm
,
,
,
,
,
,
,
,
,
,
,
4"x3 or 6"x1 wafers or pieces

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