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Stanford Nanofabrication Facility
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Fab Project Courses: E241 & EE412
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Device Process Courses: EE410 and EE312
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Overview
SNF Lab Manual, link to google doc
SNF Lab Manual
SNF Lab Manual
Safety Training
SDS
Gowning lab specific
Garment checkout for Cleanroom L107
Gowning Procedure for Cleanroom L107
Mavericks (ExFab Room 155) Policies
Prescription Safety Glasses
Training
Overview/Equipment List
Training Course Online
Upcoming Training, link to NEMO
Training Shadowing Form
Training Videos
All Litho class
Materials
Overview
Chemicals & Materials
Cleanliness Groups
"All" List of Tools
"Clean" List of Tools
"Clean-Ge" List of Tools
"Clean (MOCVD)" List of Tools
"Semiclean" List of Tools
"Flexible" List of Tools
New Process or Material Requests (PROM)
ProM Committee
ProM Approach
TMAH Protocols
TMAH Checklist
PROM (PRocess and Materials) Form
PROM archive view
Chemicals List
Acids
Bases
Developers
Metal Etchants
Other Chemicals
Primer
Resists
Solvents
Substrate Types and Sizes
Materials List
Gases List
Useful Links
Run NEMO (login required)
NEMO User Guide
External Links
Wafer Dopant and Resistivity Specs
Face shield cleaning using steamer
Tool Monitoring
Emergency and People
For Emergencies
Staff List
Consultants
Process Staff Liaisons
Equipment
Equipment Name Table
Characterization (link to Processing Techniques)
CVD (link to Processing Techniques)
MOCVD Equipment
ALD Equipment
PECVD Equipment
LPCVD Equipment
Doping (link to Processing Techniques)
Dry Etch (link to Processing Techniques)
RIE Etchers
Vapor Etchers
CCP Etchers
Downstream Plasma Etchers
ICP Etchers
Legacy Dry Etch Equipment Overview
Metallization (link to Processing Techniques)
Oxidation and Annealing (link to Processing Techniques)
Photolithography (link to Processing Techniques)
Lithography Oven Equipment
Resist Coat Equipment
Resist Develop Equipment
Resist Exposure Equipment
Wet Chemical Processing (link to Processing Techniques)
Silicon Germanium
Chemical Formula:
SiGe
Equipment Tables
Summary
Specifications
