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N2 Annealing in clean Thermco

PROM Request Title: 
N2 Annealing in clean Thermco
PROM Request Summary: 
Request to bring wafers from outside the cleanroom directly into clean Thermco tool. Documentation provided demonstrating VPD ICPMS results of clean lab.
PROM Date: 
03/19/2019
PROM Decision: 
Request approved. Please see process staff for details.