5 inch

Equipment name & NEMO ID	Training Required & Charges	Cleanliness	Location	Notes
Mask Scrubber masksrub	Mask Scrubber Training	All	SNF Paul G Allen L107 Cleanroom	5 inch mask cleaning, water under pressure, no chemicals
ASML PAS 5500/60 i-line Stepper asml	Stepper ASML PAS 5500/60 i-line Training	All	SNF Paul G Allen L107 Cleanroom	5:1 reducing stepper
Karl Suss MA-6 Contact Aligner karlsuss2	Contact Aligner Karl Suss MA-6 Training	All	SNF Paul G Allen L107 Cleanroom	1:1 Contact Aligner. Backside align.
Karl Suss MA-6 Contact Aligner karlsuss	Contact Aligner Karl Suss MA-6 Training	All	SNF Paul G Allen L107 Cleanroom	1:1 Contact Aligner. Backside align, including IR.

Equipment name & NEMO ID	Technique	Cleanliness	Exposure Wavelength	Mask Size	Max Exposure Area	Chemicals	Substrate Size	Substrate Type
ASML PAS 5500/60 i-line Stepper asml	Photolithography > Exposure > Stepper	All	365 nm	5 inch			4"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂)
Karl Suss MA-6 Contact Aligner karlsuss	Photolithography > Exposure > Contact Aligner	All	365 nm	4 inch, 5 inch, 7 inch	5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch		Pieces 2" 3" 4" 6"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (GaN) , (III-V) , (GaAs) , (Various)
Karl Suss MA-6 Contact Aligner karlsuss2	Photolithography > Exposure > Contact Aligner	All	365 nm or 405 nm	4 inch, 5 inch, 7 inch	5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch		Pieces 2" 3" 4" 6"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (GaN) , (III-V) , (GaAs) , (Various)
Mask Scrubber masksrub	Photolithography > Mask Cleaning (manual) Wet Chemical Processing	All		5 inch		DI Water