Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents!
Automatic development.
non contact 3D optical profiling
Wet Resist Removal: SRS-100 or PRS1000
Spray coating of resists
Resist as mask allowed
Automatic Resist spinning and bake
Manual solvent cleaning, two ultrasonic baths.
Pieces need a carrier wafer; Isotropic Etching
reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter
For more than 300nm deposition, please contact staff in advance.
