Equipment name & NEMO ID |
Training Required & Charges![]() |
Cleanliness | Location | Notes |
---|---|---|---|---|
Tystar Bank 3 Tube 12 Poly B3T12 Clean Poly |
Tystar LPCVD Tube Training | Clean | SNF Cleanroom Paul G Allen L107 | |
Tystar Bank 1 Tube 3 Poly B1T3 Flexible Poly |
Tystar LPCVD Tube Training | Flexible | SNF Cleanroom Paul G Allen L107 | |
CHA Solutions II Evaporator cha-evap |
Evaporator CHA Training | Flexible | SNF Cleanroom Paul G Allen L107 |
For more than 300nm deposition, please contact Neel Mehta <nmehta26@stanford.edu> in advance |
Equipment name & NEMO ID | Technique | Cleanliness | Primary Materials Etched | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|
Wet Bench Solvent Lithography lithosolv |
Flexible |
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Woollam woollam |
All |
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1 | |||||
Xactix Xenon Difluoride Etcher xactix |
All |
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1 |