Chemical Formula:
SiO2
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
Equipment name & NEMO ID |
Technique | Cleanliness | Primary Materials Etched | Other Materials Etched | Material Thickness Range | Materials Lab Supplied | Materials User Supplied | Minimum Resolution | Exposure Wavelength | Mask Size | Max Exposure Area | Resist | Process Temperature Range | Chemicals | Gases | Sample Size Limits | Resolution Notes | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
|
AJA Evaporator aja-evap |
Flexible |
0.00 -
300.00 nm
|
4"x3 or 6"x1 wafers or pieces | |||||||||||||||||
|
ASML PAS 5500/60 i-line Stepper asml |
"All" |
|
365 nm | 5 inch | ||||||||||||||||
|
Critical Point Dryer Tousimis Automegasamdri-936 cpd |
Flexible | |||||||||||||||||||
|
DISCO Wafer Saw DISCO wafersaw |
Flexible | 1x4", 1x6" or 1x8" wafer, or pieces | ||||||||||||||||||
|
EVG 101 Spray Coater evgspraycoat |
"All" | 1 | ||||||||||||||||||
|
Fiji 2 ALD fiji2 |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
|||||||||||||||||
|
Finetech Lambda flipchipbonder |
Flexible |
°C - 400 °C
|
1 | |||||||||||||||||
|
Flexus 2320 Stress Tester stresstest |
"All" | 1 | ||||||||||||||||||
|
Headway Manual Resist Spinner headway2 |
"All" | one piece or wafer | ||||||||||||||||||
|
Heidelberg MLA 150 heidelberg |
"All" |
|
405 nm | 1 | ||||||||||||||||
|
Heidelberg MLA 150 - 2 heidelberg2 |
"All" |
|
375 nm | 1 | ||||||||||||||||
|
HMDS Vapor Prime Oven, YES yes |
"All" |
150 ºC
|
||||||||||||||||||
|
Karl Suss MA-6 Contact Aligner karlsuss2 |
"All" |
|
365 nm or 405 nm | 4 inch, 5 inch, 7 inch | 5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch | |||||||||||||||
|
Karl Suss MA-6 Contact Aligner karlsuss |
"All" |
|
365 nm | 4 inch, 5 inch, 7 inch | 5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch | |||||||||||||||
|
Keyence Digital Microscope VHX-6000 keyence |
"All" | |||||||||||||||||||
|
Lakeshore Hall Measurement System LakeshoreHall |
"All" |
100.00 μm -
1000.00 μm
|
-258 °C - 1000 °C
|
8 in wafer |
Sensor Transducer Size is 14 mm diameter |
1 piece | ||||||||||||||
|
LEI1500 Contactless Sheet Resistance Mapping eddycurrent |
"All" | 8 in wafer |
Sensor Transducer Size is 14 mm diameter |
1 wafer(2" to 8") | ||||||||||||||||
|
Lesker Sputter lesker-sputter |
Flexible | 1 4 inch wafer, 1 6 inch wafer | ||||||||||||||||||
|
Lesker2 Sputter lesker2-sputter |
Semiclean |
1.00 μm
|
°C - 800 °C
|
one 4 inch wafer, one 6 inch wafer | ||||||||||||||||
|
Matrix Plasma Resist Strip matrix |
Flexible | 25 |