Chemical Formula:
Ge
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID | Technique | Cleanliness | Primary Materials Etched | Other Materials Etched | Material Thickness Range | Materials Lab Supplied | Materials User Supplied | Minimum Resolution | Exposure Wavelength | Mask Size | Max Exposure Area | Process Temperature Range | Chemicals | Gases | Sample Size Limits | Resolution Notes | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
|
Savannah ALD savannah |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 250 °C
|
||||||||||||||||
|
Samco PC300 Plasma Etch System samco |
Flexible |
20 ºC
|
Four 4" wafers or two 6" wafers and one 8" wafer | ||||||||||||||||
|
Prometrix Resistivity Mapping System prometrix |
"All" | 1 | |||||||||||||||||
|
Profilometer AlphaStep D-300 alphastep2 |
Flexible | 1 | |||||||||||||||||
|
Profilometer Alphastep 500 alphastep |
Flexible | 1 | |||||||||||||||||
|
PlasmaTherm Shuttlelock PECVD System ccp-dep |
"All" |
100.00 Å -
4.00 μm
|
100 °C - 350 °C
|
4 | |||||||||||||||
|
Oven BlueM 200°C to 430°C bluem |
Flexible |
0 °C - 430 °C
|
|||||||||||||||||
|
Oven 90°C prebake oven90 |
"All" |
90 ºC
|
|||||||||||||||||
|
Oven 110°C post-bake oven110 |
"All" |
110 ºC
|
|||||||||||||||||
|
Oven (White) white-oven |
Flexible |
0 °C - 200 °C
|
|||||||||||||||||
|
Nanospec 210XP nanospec2 |
"All" | ||||||||||||||||||
|
micromanipulator6000 IV-CV probe station micromanipulator6000 |
"All" | 1x4" wafer | |||||||||||||||||
|
Lesker2 Sputter lesker2-sputter |
Semiclean |
1.00 μm
|
°C - 800 °C
|
one 4 inch wafer, one 6 inch wafer | |||||||||||||||
|
Lesker Sputter lesker-sputter |
Flexible | 1 4 inch wafer, 1 6 inch wafer | |||||||||||||||||
|
LEI1500 Contactless Sheet Resistance Mapping eddycurrent |
"All" | 8 in wafer |
Sensor Transducer Size is 14 mm diameter |
1 wafer(2" to 8") | |||||||||||||||
|
Lakeshore Hall Measurement System LakeshoreHall |
"All" |
100.00 μm -
1000.00 μm
|
-258 °C - 1000 °C
|
8 in wafer |
Sensor Transducer Size is 14 mm diameter |
1 piece | |||||||||||||
|
Keyence Digital Microscope VHX-6000 keyence |
"All" | ||||||||||||||||||
|
Karl Suss MA-6 Contact Aligner karlsuss2 |
"All" |
|
365 nm or 405 nm | 4 inch, 5 inch, 7 inch | 5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch | ||||||||||||||
|
Karl Suss MA-6 Contact Aligner karlsuss |
"All" |
|
365 nm | 4 inch, 5 inch, 7 inch | 5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch | ||||||||||||||
|
HMDS Vapor Prime Oven, YES yes |
"All" |
150 ºC
|