Prometrix Resistivity Mapping System prometrix |
Prometrix Training |
All |
SNF Cleanroom Paul G Allen L107 |
3 Probe Heads for different cleanliness groups.
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Samco PC300 Plasma Etch System samco |
Samco Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
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Tystar Bank 3 Tube 11 TEOS B3T11 Clean TEOS |
Tystar LPCVD Tube Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
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Wet Bench Clean_res- hotphos wbclean_res-hotphos |
Wet Bench Clean Piranha/HF/Phosphoric Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
Resist should have been removed
|
Wet Bench Clean 1 wbclean-1 |
Wet Bench Clean1and2 Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
No resist allowed. Resist should have been removed at the wbclean_res-piranha.
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Oven (White) white-oven |
White Oven Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
For LOL2000 bake or bakes which are not allowed in the other ovens and need higher temperatures, up to 200C, programmable.
|
Flexus 2320 Stress Tester stresstest |
Stress Tester Flexus 2320 Training |
All |
SNF Cleanroom Paul G Allen L107 |
|
Lesker2 Sputter lesker2-sputter |
Sputter Lesker 1&2 Training |
Semiclean |
SNF Cleanroom Paul G Allen L107 |
reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter
|
Tystar Bank 2 Tube 8 LTO B2T8 Clean LTO |
Tystar LPCVD Tube Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
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Wet Bench Flexcorr 1 wbflexcorr-1 |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
|
MRC Reactive Ion Etcher mrc |
MRC Reactive Ion Etcher Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Typically used for sputter etching; Single wafer, direct load system; wafers/ pieces can be directly placed on electrode
|
Oven BlueM 200°C to 430°C bluem |
Blue M Oven Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Convection in N2. Cure. Programmable.
|
AJA2 Evaporator aja2-evap |
Evaporator AJA2 Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
For more than 300nm deposition, please contact Gabe Catalano <gcatalano@stanford.edu> in advance
|
CHA Solutions II Evaporator cha-evap |
Evaporator CHA Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
For more than 300nm deposition, please contact Neel Mehta <nmehta26@stanford.edu> in advance
|
SEM -Zeiss Merlin sem-merlin |
SEM-Merlin Training |
All |
SNF Exfab Paul G Allen 104 Stinson |
|
Profilometer AlphaStep D-300 alphastep2 |
AlphaStep2 Training |
Flexible |
SNF Exfab Paul G Allen 104 Stinson |
|
Headway 3 Manual Resist Spinner headway3 |
Resist Coat (manual) Headway 3 Training |
All |
SNF Exfab Paul G Allen 104 Stinson |
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Ex Fab Develop Wet Bench wbexfab_dev |
WbExfab_Dev Training |
Flexible |
SNF Exfab Paul G Allen 104 Stinson |
Manual development of resist in beakers. SNF approved developers only. No solvents!
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Keyence Digital Microscope VHX-6000 keyence |
Microscope Keyence Training |
All |
SNF Exfab Paul G Allen 104 Stinson |
|
Finetech Lambda flipchipbonder |
Flip Chip Bonder Training |
Flexible |
SNF Exfab Paul G Allen 104 Stinson |
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