Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Notes |
---|---|---|---|---|
Aixtron MOCVD - III-N system aix-ccs |
MOCVD - III-N Aixtron training | Clean (MOCVD) | SNF MOCVD Paul G Allen 213XA |
N and P doping available. |
Aixtron MOCVD - III-V system aix200 |
MOCVD - III-V Aixtron training | Flexible | SNF MOCVD Paul G Allen 213XA |
N and P doping available. |
PDS 2010 LABCOTER™ 2 Parylene Deposition System parcoater |
Parylene Coater Training | Flexible | SNF Exfab Paul G Allen 155 Mavericks | |
Plasmaetch PE-50 plasma-etch |
Plasmaetch PE-50 Training | Flexible | SNF Exfab Paul G Allen 155 Mavericks |
Low power, high pressure plasma; low bias, minimal damage. Often used for surface treatment At SNF - nSiL lab |
Equipment name & NEMO ID | Technique | Cleanliness | Primary Materials Etched | Process Temperature Range | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|
Wet Bench Resist Strip wbresstrip-1 |
Clean (Ge), Semiclean, Flexible |
20 °C - 60 °C
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25 4 inch wafers | |||||
Wet Bench Solvent Lithography lithosolv |
Flexible |
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Woollam woollam |
All |
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1 | ||||||
Xactix Xenon Difluoride Etcher xactix |
All |
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1 |