Short Name:
4"
The following is a list of equipment where 4 inch round substrates are allowed.
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID | Technique | Cleanliness | Primary Materials Etched | Developer | Process Temperature Range | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|---|---|---|
|
Wet Bench Miscellaneous wbmiscres |
Flexible | |||||||||
|
Wet Bench Resist Strip wbresstrip-1 |
Clean (Ge), Semiclean, Flexible |
20 °C - 60 °C
|
25 4 inch wafers | |||||||
|
Wet Bench Solvent Lithography lithosolv |
Flexible | |||||||||
|
Woollam woollam |
"All" | 1 | ||||||||
|
Xactix Xenon Difluoride Etcher xactix |
"All" | 1 |