4 inch wafer
Short Name:
4"
The following is a list of equipment where 4 inch round substrates are allowed.
| Equipment name & NEMO ID |
Training Required & Charges |
Cleanliness | Location | Notes |
|---|---|---|---|---|
|
CHA Solutions II Evaporator cha-evap |
Evaporator CHA Training | Flexible | SNF Paul G Allen L107 Cleanroom |
For more than 300nm deposition, please contact Neel Mehta <nmehta26@stanford.edu> in advance |
| KJL Evaporator 1 | KJL Evaporator 1 Training | SNSF NPC Spilker suite 6 | ||
|
Oxford Plasma Pro ICP-RIE ALE Ox-ALE |
Oxford Plasma Pro ICP-RIE ALE Training | Flexible | SNF Paul G Allen L107 Cleanroom | |
|
Oxford Plasma Pro ICP-RIE Ox Ox-Ox |
Oxford Plasma Pro ICP-RIE Ox Training | Clean | SNF Paul G Allen L107 Cleanroom | |
|
Oxford Plasma Pro PECVD Ox-PECVD |
Oxford Plasma Pro PECVD Training | Semiclean, Flexible | SNF Paul G Allen L107 Cleanroom |
Pages
| Equipment name & NEMO ID | Technique | Cleanliness | Primary Materials Etched | Developer | Process Temperature Range | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|---|---|---|
|
Wet Bench Miscellaneous wbmiscres |
Flexible |
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|
Wet Bench Resist Strip wbresstrip-1 |
Clean (Ge), Semiclean, Flexible |
20 °C - 60 °C
|
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25 4 inch wafers | ||||||
|
Wet Bench Solvent Lithography lithosolv |
Flexible |
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|
Woollam woollam |
"All" |
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1 | |||||||
|
Xactix Xenon Difluoride Etcher xactix |
"All" |
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1 |
