Equipment name & NEMO ID![]() |
Training Required & Charges | Cleanliness | Location | Notes |
---|---|---|---|---|
Wet Bench Miscellaneous wbmiscres |
Wet Bench Miscellaneous Photoresist Training | Flexible | SNF Cleanroom Paul G Allen L107 |
Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents! |
Wet Bench Resist Strip wbresstrip-1 |
Wet Bench Resist Strip | Clean (Ge), Semiclean, Flexible | SNF Cleanroom Paul G Allen L107 |
Wet Resist Removal: SRS-100 or PRS1000 |
Wet Bench Solvent Lithography lithosolv |
Lithography Solvent Bench Training | Flexible | SNF Cleanroom Paul G Allen L107 |
Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning. |
Woollam woollam |
Woollam Training | All | SNF Cleanroom Paul G Allen L107 | |
Xactix Xenon Difluoride Etcher xactix |
Xactix Xenon Difluoride Etcher Training | All | SNF Cleanroom Paul G Allen L107 |
Isotropic Si etching; can be used for backside Si removal on small pieces |
Equipment name & NEMO ID![]() |
Technique | Cleanliness | Primary Materials Etched | Developer | Process Temperature Range | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|
Wet Bench Miscellaneous wbmiscres |
Flexible |
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Wet Bench Resist Strip wbresstrip-1 |
Clean (Ge), Semiclean, Flexible |
20 °C - 60 °C
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25 4 inch wafers | ||||||
Wet Bench Solvent Lithography lithosolv |
Flexible |
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Woollam woollam |
All |
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1 | |||||||
Xactix Xenon Difluoride Etcher xactix |
All |
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1 |